CSM Ultrapure Water RO elements are used to produce process water used for the manufacturing of electronics and semiconductors. These elements have high TOC rejection, low TOC extraction and TOC rinse down.
Model Flow Rate
(GPD,m3/d)
Salt Rejection (%) IPA Rejection (%) Diameter/
Length (inch)
Test Conditions Spec Sheet
RE8040-UL440 11,000 (41.6) 99.5 95.0 8.0 / 40 40"BW Standard
RE8040-HUE440 10,000 (37.9) 99.5 96.0 8.0 / 40 40"BW Standard
RE8040-HUE 9,000 (34.1) 99.5 96.0 8.0 / 40 40"BW Standard
RE8040-UL 10,000 (37.9) 99.5 92.0 8.0 / 40 40"LP Standard
40" BW Standard test conditions: NaCl 2,000 mg/L, Pressure 225 psig, Temperature 25°C, pH 6.5-7.0 Recovery 15%
40" PL Standard test conditions: NaCl 1,500 mg/L, Pressure 225 psig, Temperature 25°C, pH 6.5-7.0 Recovery 15%
IPA rejection test conditions: IPA 1,000 mg/L, Pressure 225 psig, for UE, HUE and 150 psig for UL, Temperature 25°C, pH 6.5-7.0 Recovery 15%
The stated data were obtained after 30 minutes of operation
IPA rejection data were obtained after 2 hours of operation under the IPA rejection test conditions